SUSCEPTOR AND CHEMICAL VAPOR DEPOSITION APPARATUS COMPRISING THE SAME

摘要

PURPOSE: A susceptor and chemical vapor deposition apparatus comprising the same are provided to extend the lifetime of a susceptor by reducing thermal stress of the susceptor by comprising the susceptor with demountable pieces. CONSTITUTION: A plurality of susceptor pieces(110-1) are combined as a disc. A protruding unit(112) of the susceptor piece is inserted to a groove(113) of the susceptor piece. At least a pocket(111) is prepared on the each piece of a plurality of susceptors. At least one of the pockets includes a deposition target. An inflow unit(115a) of the susceptor is installed on the lower part of the susceptor.