| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a drawing device capable of controlling a device at a level identical to that of reproduction of a drawing processing, which has been already completed. <P>SOLUTION: A drawing device 100 comprises a drawing part 150 for drawing a pattern on a sample using an electron beam; a storage device 142 for storing an environment data history, in which environment data fetched during processing a past drawing processing which has been already completed is recorded; an environment data processing part 32 for inputting the environment data history, and processing the environment data recorded in the environment data history as current environment data; a correction part 20 for correcting a drawing position on the sample to reproduce the past drawing processing using the environment data recorded in the environment data history; and a drawing processing control part 14 for controlling the current drawing processing to draw the pattern at the drawing position of the sample, at which the past drawing processing is reproduced by correction. <P>COPYRIGHT: (C)2012,JPO&INPIT |
