发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE MATERIAL COMPRISING THE SAME |
摘要 |
The present invention relates to a photosensitive resin composition and a photosensitive material comprising the same. The photosensitive resin composition according to an exemplary embodiment of the present invention may comprise two multi-functional monomers where structures of side chains comprising unsaturated double bonds are different from each other while a composition ratio is changed. Accordingly, in the exemplary embodiment of the present invention, processability is excellent, and it is possible to decrease defects by a rupture when a LCD substrate is sealed and substrate separation defects due to an impact to the LCD products by improving an adhesion property to a lower substrate after a hard baking process. |
申请公布号 |
US2012189961(A1) |
申请公布日期 |
2012.07.26 |
申请号 |
US201213353066 |
申请日期 |
2012.01.18 |
申请人 |
JI HO CHAN;KIM SUNGHYUN;CHOI DONGCHANG;CHOI KYUNG SOO;CHA GEUN YOUNG;LEE SANG CHUL;LG CHEM, LTD. |
发明人 |
JI HO CHAN;KIM SUNGHYUN;CHOI DONGCHANG;CHOI KYUNG SOO;CHA GEUN YOUNG;LEE SANG CHUL |
分类号 |
G03F7/20;G03F7/032 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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