SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD

摘要

PURPOSE: A semiconductor manufacturing apparatus and semiconductor manufacturing method are provided to safely remove oily silane without reduction of throughput by installing a drain and separately processing the same from a reaction chamber. CONSTITUTION: A wafer is arranged on a support member. A heater(19) heats the wafer up to a set temperature. A rotation driving control device(18) rotates the wafer. A gas release device(13) includes an exhaust pipe releasing gases from a reaction chamber. A drain(14c) uses oily silane installed in the lower part of the reaction chamber.