发明名称 FOCUSED ION BEAM APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a focused ion beam apparatus capable of prolonging a service life of an aperture, preventing contaminants from increasing even when a column valve is closed, and being restarted in short time. <P>SOLUTION: A high-voltage power supply controller 181 lowers an extraction voltage applied to an extraction electrode 17 or lowers a control voltage applied to a control electrode 16 to set an emission to 0 &mu;A, in closing operation of a column valve 14. Also, the high-voltage power supply controller 181 returns the extraction voltage applied to the extraction electrode 17 to an original extraction voltage or returns the control voltage applied to the control electrode 16 to an original control voltage, in opening operation of the column valve 14. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012142312(A) 申请公布日期 2012.07.26
申请号 JP20120101999 申请日期 2012.04.27
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 KAGA HIROYASU
分类号 H01J37/317;H01J27/26;H01J37/08 主分类号 H01J37/317
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