发明名称 |
OPTICAL ARRANGEMENT IN A PROJECTION EXPOSURE APPARATUS FOR EUV LITHOGRAPHY |
摘要 |
An optical arrangement includes a multiplicity of optical elements and a carrier structure which carries the optical elements. The carrier structure is composed of at least two releasably interconnected modules. Each module is composed of at least one carrier structure subelement. A subhousing is produced by a multiplicity of carrier structure subelements and/or modules. The subhousing has a geometry that varies, at least in regions, in correspondence to a usable beam path in the projection exposure apparatus, the usable beam path being defined as an envelope of all light bundles which can propagate from all field points in a field plane to an image plane of the projection exposure apparatus. A projection exposure apparatus for EUV lithography includes such an optical arrangement. |
申请公布号 |
US2012188523(A1) |
申请公布日期 |
2012.07.26 |
申请号 |
US201213405882 |
申请日期 |
2012.02.27 |
申请人 |
KULITSKY VIKTOR;GELLRICH BERNHARD;XALTER STEFAN;KWAN YIM-BUN PATRICK;DEUFEL PETER;WURMBRAND ANDREAS;CARL ZEISS SMT GMBH |
发明人 |
KULITSKY VIKTOR;GELLRICH BERNHARD;XALTER STEFAN;KWAN YIM-BUN PATRICK;DEUFEL PETER;WURMBRAND ANDREAS |
分类号 |
G03B27/70;G02B7/182 |
主分类号 |
G03B27/70 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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