发明名称 Semiconductor Device and Method of Forming a Fan-Out Structure with Integrated Passive Device and Discrete Component
摘要 A semiconductor device is made by providing a temporary carrier for supporting the semiconductor device. An integrated passive device (IPD) is mounted to the temporary carrier using an adhesive. The IPD includes a capacitor and a resistor and has a plurality of through-silicon vias (TSVs). A discrete component is mounted to the temporary carrier using the adhesive. The discrete component includes a capacitor. The IPD and the discrete component are encapsulated using a molding compound. A first metal layer is formed over the molding compound. The first metal layer is connected to the TSVs of the IPD and forms an inductor. The temporary carrier and the adhesive are removed, and a second metal layer is formed over the IPD and the discrete component. The second metal layer interconnects the IPD and the discrete component and forms an inductor. An optional interconnect structure is formed over the second metal layer.
申请公布号 US2012187572(A1) 申请公布日期 2012.07.26
申请号 US201213438696 申请日期 2012.04.03
申请人 LIN YAOJIAN;FANG JIANMIN;CHEN KANG;CAO HAIJING;STATS CHIPPAC, LTD. 发明人 LIN YAOJIAN;FANG JIANMIN;CHEN KANG;CAO HAIJING
分类号 H01L23/48 主分类号 H01L23/48
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