| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition good at lithography performances such as MEEF performance and LWR performance and good at resistance to pattern falling. <P>SOLUTION: A radiation-sensitive composition comprises: (A) a polymer including a structural unit having an acid-decomposable group; (B) a compound producing sulfonic acid, carboxylic acid or sulfonamide through irradiation with radiation, the sulfonic acid, the carboxylic acid or the sulfonamide having at least one fluorine atom or perfluoroalkyl group bonded to a carbon atom of the α-position; and (C) a compound producing sulfonic acid, carboxylic acid or sulfonamide through irradiation with radiation, the sulfonic acid, the carboxylic acid or the sulfonamide having neither a fluorine atom nor a perfluoroalkyl group bonded to a carbon atom of the α-position. <P>COPYRIGHT: (C)2012,JPO&INPIT |
