发明名称 PLASMA GENERATING APPARATUS, PLASMA PROCESSING APPARATUS, PLASMA GENERATING METHOD, AND PLASMA PROCESSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma generating apparatus which can generate a stronger electric field strength, and to provide a plasma processing apparatus, a plasma generating method and a plasma processing method. <P>SOLUTION: The plasma generating apparatus which generates plasma by radiating microwaves to a plasma generating region comprises a microwave generation unit which generates microwaves, a resonance unit which resonates the microwaves, and a radiation control unit which controls radiation of the microwaves from the resonance unit to the plasma generating region. The radiation control unit stores the energy of the microwaves in the resonance unit by suppressing radiation of the microwaves, and enhances the electric field strength by emitting the energy of the microwaves. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012142172(A) 申请公布日期 2012.07.26
申请号 JP20100293660 申请日期 2010.12.28
申请人 SHIBAURA MECHATRONICS CORP;CHUBE UNIV 发明人 SUGAI HIDEO;IVAN PETROV GANASHEV
分类号 H05H1/24;H01L21/205;H01L21/3065;H01L21/31;H05H1/46 主分类号 H05H1/24
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