MAINTENANCE METHOD, EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To perform immersion exposure while efficiently maintaining an exposure apparatus.

SOLUTION: The exposure apparatus comprises: an immersion space forming member 30 for forming an immersion region by supplying a liquid 1 between an optical member 2 and a substrate P; a liquid supply mechanism 10 for supplying the liquid 1 to an immersion space; a substrate stage PST for moving the substrate P; and a measurement stage MST having a reference mark formed thereon. In the exposure apparatus, a cleaning solution is supplied between the measurement stage MST and the immersion space forming member 30 in order to clean the immersion space forming member 30. The exposure apparatus further comprises various cleaning mechanisms for cleaning the immersion space forming member 30.

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