METHOD AND APPARATUS FOR PRODUCTION OF ROTATABLE SPUTTERING TARGETS

摘要

The present invention relates to a method and apparatus for producing rotatable sputtering targets by means of continuous casting. Target material is deposited around a cylindrical target holder (14) by means of a movable mould (30) surrounding the target holder. The mould (30) is fed with molten metal while it is translated along the target holder to progressively form the layer of molten metal on the outer surface of the target holder.