| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress liquid leakage. <P>SOLUTION: An exposure apparatus exposes a substrate via a projection optical system and a liquid. The exposure apparatus comprises: a first stage movable with the substrate mounted thereon within a predetermined area including a first area where the projection optical system is disposed and a second area different from the first area; a second stage movable within the predetermined area; a linear motor system for moving each of the first and second stages from one of the first and second areas to the other and moving the first and second stages independently within the predetermined area; a liquid immersion system for supplying the liquid to form a liquid immersion area just under the projection optical system; and a control system for moving the first and second stages under the projection optical system by means of the linear motor system while maintaining the liquid immersion area just under the projection optical system such that one of a first state in which the liquid immersion area is maintained between the projection optical system and the first stage and a second state in which the liquid immersion area is maintained between the projection optical system and the second stage transitions to the other. <P>COPYRIGHT: (C)2012,JPO&INPIT |
