| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate heat treatment apparatus which causes little uneven heating on a substrate stage when a substrate is heated in a vacuum. <P>SOLUTION: A substrate heat treatment apparatus includes: a substrate holder unit including a substrate stage on which a substrate is placed; a heating unit which is provided above the substrate stage, includes a heat radiation surface facing the substrate stage, and heats the substrate placed on the substrate stage with radiation heat from the heat radiation surface in non contact manner; a cooling part provided below the substrate stage; and support pillars supporting the substrate stage fixed to the cooling part. Each support pillar is composed of multiple members having different thermal conductivity. <P>COPYRIGHT: (C)2012,JPO&INPIT |
