发明名称 |
IMPRINT APPARATUS, DETECTION METHOD, ARTICLE MANUFACTURING METHOD, AND FOREIGN PARTICLE DETECTION APPARATUS |
摘要 |
The present invention provides an imprint apparatus for performing an imprint process of transferring a pattern onto a substrate by curing a resin on the substrate while the resin is in contact with a mold, and removing the mold from the cured resin, including a detection unit configured to detect a foreign particle existing on the substrate, wherein the detection unit includes an obtaining unit configured to irradiate a surface of the substrate with light, and obtain light from the surface of the substrate, and a specification unit configured to specify a shot region where a foreign particle existing on the substrate is positioned, based on the light obtained by the obtaining unit.
|
申请公布号 |
US2012188536(A1) |
申请公布日期 |
2012.07.26 |
申请号 |
US201213354430 |
申请日期 |
2012.01.20 |
申请人 |
SATO HIROSHI;UEMURA TAKANORI;CANON KABUSHIKI KAISHA |
发明人 |
SATO HIROSHI;UEMURA TAKANORI |
分类号 |
G01N21/00;B05C11/00;B05C13/02;C23C16/52 |
主分类号 |
G01N21/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|