发明名称 |
METHOD AND SYSTEM FOR PROVIDING ULTRAPURE WATER |
摘要 |
A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water. |
申请公布号 |
WO2012099817(A2) |
申请公布日期 |
2012.07.26 |
申请号 |
WO2012US21424 |
申请日期 |
2012.01.16 |
申请人 |
SIEMENS INDUSTRY, INC.;COULTER, BRUCE LEE |
发明人 |
COULTER, BRUCE LEE |
分类号 |
C02F1/30;B01J19/08;C02F1/32;C02F1/70;C02F103/04 |
主分类号 |
C02F1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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