| 发明名称 |
Controlling Thickness of Residual Layer |
| 摘要 |
Methods for manufacturing a patterned surface on a substrate are described. Generally, the patterned surface is defined by a residual layer having a thickness of less than approximately 5 nm. |
| 申请公布号 |
US2012189780(A1) |
申请公布日期 |
2012.07.26 |
| 申请号 |
US201213429903 |
申请日期 |
2012.03.26 |
| 申请人 |
LABRAKE DWAYNE L.;KHUSNATDINOV NIYAZ;JONES CHRISTOPHER ELLIS;XU FRANK Y.;MOLECULAR IMPRINTS, INC. |
发明人 |
LABRAKE DWAYNE L.;KHUSNATDINOV NIYAZ;JONES CHRISTOPHER ELLIS;XU FRANK Y. |
| 分类号 |
C08J7/04;B05D3/00;B05D5/00 |
主分类号 |
C08J7/04 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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