| 摘要 |
This method for forming ventilation holes in an electrode plate includes: a roughening step of roughening a surface of an electrode plate for a plasma processing apparatus such that a center line average roughness Ra becomes in a range of 0.2 μm to 30 μm; and a ventilation hole forming step of irradiating a laser beam having a wavelength within a range of 200 nm to 600 nm on a roughened surface of the electrode plate so as to form ventilation holes in the electrode plate which pass through the electrode plate in a thickness direction, wherein in the ventilation hole forming step, a focus spot of the laser light is swirled along a planar direction of the electrode plate so as to form a circular irradiation area, and while moving the irradiation area along a planar direction of the electrode plate in a circular movement, the focus spot of the laser light is shifted in a thickness direction of the electrode plate. |
