发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR SUBSTRATE BONDING METHOD
摘要 According to one embodiment, semiconductor manufacturing apparatus includes a first member that holds a first semiconductor substrate; a second member that holds a second semiconductor substrate in a state where a bonding surface of the second semiconductor substrate faces a bonding surface of the first semiconductor substrate; a distance detecting unit that detects a distance between the bonding surface of the first semiconductor substrate and the bonding surface of the second semiconductor substrate; an adjusting unit that adjusts the distance between the bonding surface of the first semiconductor substrate and the bonding surface of the second semiconductor substrate to a predetermined value by moving at least one of the first and second members based on a detection result of the distance detecting unit; and a third member that forms the bonding start point between the first semiconductor substrate and the second semiconductor substrate.
申请公布号 US2012190138(A1) 申请公布日期 2012.07.26
申请号 US201213354734 申请日期 2012.01.20
申请人 TANIDA KAZUMASA;HONGO SATOSHI;YAMAGUCHI NAOKO;TAKAHASHI KENJI;NUMATA HIDEO;KABUSHIKI KAISHA TOSHIBA 发明人 TANIDA KAZUMASA;HONGO SATOSHI;YAMAGUCHI NAOKO;TAKAHASHI KENJI;NUMATA HIDEO
分类号 H01L21/66;B32B37/30;B32B41/00 主分类号 H01L21/66
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