| 摘要 |
PURPOSE: A photomask and a manufacturing method thereof are provided to implement the structure capable of controlling the transmittivity by offering a photomask equipped with the multiple halfton portion. CONSTITUTION: A photomask comprises the optical transmission part(122) formed on the transparent substrate, and the light-blocking region and semi-permeable part(123). The semi-permeable part comprises the multiple halfton portion in which the half tone material is filled in the slit yarn lice of structure. The multiple halfton portion comprises the slip-shape light shield wall(121) having the fixed interval. The semipermeable material layer is formed on the slip-shape light shield wall and light-blocking region. |
