发明名称 |
PATTERNING SUBSTRATES EMPLOYING MULTIPLE CHUCKS |
摘要 |
The present invention is directed towards a method for patterning first and second substrates in a nanoimprint lithography system, the method including, inter alia, positioning the first substrate on a first substrate chuck; positioning a nanoimprint material on the first substrate; obtaining a spatial relationship between the first substrate and a nanoimprint mold assembly and imprinting a pattern in the nanoimprint material on the first substrate with the nanoimprint mold assembly while concurrently positioning the second substrate on a second substrate chuck; separating the nanoimprint mold assembly from the nanoimprint material on the first substrate; positioning a nanoimprint material on the second substrate; removing the first substrate from the first substrate chuck while concurrently obtaining a spatial relationship between the second substrate and the nanoimprint mold assembly and imprinting a pattern in the nanoimprint material on the second substrate with the nanoimprint mold assembly; and separating the nanoimprint mold assembly from the nanoimprint material on the second substrate, with the first and second substrates being subjected to substantially the same process conditions. |
申请公布号 |
EP1973719(A4) |
申请公布日期 |
2012.07.25 |
申请号 |
EP20070718012 |
申请日期 |
2007.01.20 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
CHOI, BYUNG-JIN;SREENIVASAN, SIDLGATA V. |
分类号 |
G03F7/00;B29C37/02;G03F1/92 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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