发明名称 METHOD FOR MANUFACTURING COMBINED SUBSTRATE HAVING SILICON CARBIDE SUBSTRATE
摘要 A connected substrate having a supporting portion and first and second silicon carbide substrates is prepared. The first silicon carbide substrate has a first backside surface connected to the supporting portion, a first front-side surface, and a first side surface connecting the first backside surface and the first front-side surface to each other. The second silicon carbide substrate has a second backside surface connected to the supporting portion, a second front-side surface, and a second side surface connecting the second backside surface and the second front-side surface to each other and forming a gap between the first side surface and the second side surface. A filling portion for filling the gap is formed. Then, the first and second front-side surfaces are polished. Then, the filling portion is removed. Then, a closing portion for closing the gap is formed.
申请公布号 KR20120083381(A) 申请公布日期 2012.07.25
申请号 KR20127008753 申请日期 2011.06.17
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 HORI TSUTOMU;HARADA SHIN;SASAKI MAKOTO;INOUE HIROKI;OKITA KYOKO;NAMIKAWA YASUO;ITOH SATOMI
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
主权项
地址