SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: Substrate processing apparatus prevents a danger caused by wrongly guided gas mixture by displaying the flow of a gas inside a gas pipe prior to the opening and closing of an electric valve. CONSTITUTION: A liquid controller(43) connected to a display attachment controller(44) controls the operation of a gas pipe and exhaust system(35). The display attachment controller displays a wafer processing status in a processing chamber(34). A gas pipe supplies a process gas. An interlock electric valve is installed on a gas pipe.