发明名称 |
Substrate support with electrostatic chuck having dual temperature zones |
摘要 |
An electrostatic chuck for receiving a substrate in a substrate processing chamber comprises a ceramic puck having a substrate receiving surface and an opposing backside surface with a plurality of spaced apart mesas. An electrode is embedded in the ceramic puck to generate an electrostatic force to hold a substrate. Heater coils located at peripheral and central portions of the ceramic puck allow independent control of temperatures of the central and peripheral portions of the ceramic puck. The chuck is supported by a base having a groove with retained air. The chuck and base can also have an overlying edge ring and clamp ring. |
申请公布号 |
US8226769(B2) |
申请公布日期 |
2012.07.24 |
申请号 |
US20070740869 |
申请日期 |
2007.04.26 |
申请人 |
MATYUSHKIN ALEXANDER;KOOSAU DENNIS;PANAGOPOULOS THEODOROS;HOLLAND JOHN;APPLIED MATERIALS, INC. |
发明人 |
MATYUSHKIN ALEXANDER;KOOSAU DENNIS;PANAGOPOULOS THEODOROS;HOLLAND JOHN |
分类号 |
C23C16/458;C23C16/06;C23C16/22;C23C16/46;C23F1/00;H01L21/306 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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