| 摘要 |
An integrated circuit fabricated by a mask set including a mask to generate a metal pattern defined by CAD software, the metal pattern generation method including: reading a binary data set, the data points in the set uniquely matched to a plurality of fixed metal tabs; and selecting a metal tab from a first set of selectable metal tabs for a first data value, or a second set of selectable metal tabs for a second data value for each of the fixed metal tabs; wherein a first set metal tab and a second set metal tab couples each said fixed metal tab to first and second voltages respectively. |
