NITROGEN-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

摘要

PURPOSE: A nitrogen-containing monomer and a patterning method are provided to suppress acid diffusion and to suppress volatilization and diffusion of a quencher ingredient. CONSTITUTION: A nitrogen-containing monomer is denoted by chemical formula 1. A polymer contains repeat unit a of chemical formula 2. The polymer is prepared by copolymerization of a repeat unit of chemical formula 2 and a repeat unit containing acid-unstable group which generates carboxyl groups and/or hydroxyl groups by acid. A positive resist material contains the polymers and organic solvent and is a chemically amplified resist material further containing acid generator.