发明名称 |
Chemical vaporizer for material deposition systems and associated methods |
摘要 |
System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse. |
申请公布号 |
US8225745(B2) |
申请公布日期 |
2012.07.24 |
申请号 |
US201113019885 |
申请日期 |
2011.02.02 |
申请人 |
MARSH EUGENE P.;ATWELL DAVID R.;MICRON TECHNOLOGY, INC. |
发明人 |
MARSH EUGENE P.;ATWELL DAVID R. |
分类号 |
C23C16/448;B05D5/00;B05D7/22;C23C16/06;C23C16/22;C23C16/52;C23F1/00;G05B15/00;H01L21/306 |
主分类号 |
C23C16/448 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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