发明名称 |
Method and system for feature function aware priority printing |
摘要 |
A method and system for photomask pattern generation is provided, and more specifically, a method and system for feature function aware priority printing is provided. The method of printing a photolithographic mask includes fracturing mask design data into write shapes that are multiples of a spot size and passing fractured mask design data to a write tool. Additionally, the method includes writing one or more non-critical shapes according to one or more time-saving rules. |
申请公布号 |
US8227774(B2) |
申请公布日期 |
2012.07.24 |
申请号 |
US20100683720 |
申请日期 |
2010.01.07 |
申请人 |
CALDWELL BRIAN N.;GALLAGHER EMILY E. F.;NASH STEVEN C.;RANKIN JED H.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CALDWELL BRIAN N.;GALLAGHER EMILY E. F.;NASH STEVEN C.;RANKIN JED H. |
分类号 |
G03F1/00;B01J19/08;G03F9/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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