发明名称 |
Methods of removing particles from over semiconductor substrates |
摘要 |
Some embodiments include methods of removing particles from over surfaces of semiconductor substrates. Liquid may be flowed across the surfaces and the particles. While the liquid is flowing, electrophoresis and/or electroosmosis may be utilized to enhance transport of the particles from the surfaces and into the liquid. In some embodiments, temperature, pH and/or ionic strength within the liquid may be altered to assist in the removal of the particles from over the surfaces of the substrates. |
申请公布号 |
US8226772(B2) |
申请公布日期 |
2012.07.24 |
申请号 |
US20090350789 |
申请日期 |
2009.01.08 |
申请人 |
GREELEY NEIL JOSEPH;MILLWARD DAN;HUANG WAYNE;MICRON TECHNOLOGY, INC. |
发明人 |
GREELEY NEIL JOSEPH;MILLWARD DAN;HUANG WAYNE |
分类号 |
B08B3/04 |
主分类号 |
B08B3/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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