发明名称 |
Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body |
摘要 |
The invention relates to a method for plasma-assisted chemical vapour deposition for coating or material removal on the inner wall of a hollow body (42). The method involves introducing a gas lance (44) into the hollow body (42) and forming a cavity plasma (45) to form a plasma cloud arranged at the tip of the gas lance by applying an electric radio-frequency field to an RF electrode (41). |
申请公布号 |
US8227052(B2) |
申请公布日期 |
2012.07.24 |
申请号 |
US20070373415 |
申请日期 |
2007.07.11 |
申请人 |
NOELL OLIVER;RALF STEIN |
发明人 |
NOELL OLIVER |
分类号 |
C23F1/00;C23C16/505;H05H1/24 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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