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发明名称
TANTALUM SPUTTERING TARGET, METHOD FOR MANUFACTURING TANTALUM SPUTTERING TARGET, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20120082943(A)
申请公布日期
2012.07.24
申请号
KR20127014984
申请日期
2010.11.04
申请人
TOSHIBA MATERIALS CO., LTD.;KABUSHIKI KAISHA TOSHIBA
发明人
NAKASHIMA NOBUAKI;ORIMOTO YOSHIKI
分类号
C23C14/34;C22F1/18
主分类号
C23C14/34
代理机构
代理人
主权项
地址
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