| 摘要 |
<p>PURPOSE: A substrate processing apparatus is provided to uniformly process a substrate by making the flow of gas uniform. CONSTITUTION: A substrate is loaded on a substrate loading stand. A baffle substrate(60) is installed in around the substrate loading stand in order to divide the interior of a process chamber into a process space and an exhaust space. An exhaust pipe(5) exhausts the interior of the process chamber. The exhaust pipe is arranged on the bottom of the process chamber. A gap(62) is formed between the substrate loading stand and the baffle substrate. A plurality of through holes(65) connecting the process space and the exhaust space is formed on the baffle substrate.</p> |
