发明名称 Wire and method for fabricating interconnection line and thin film transistor substrate and method for fabricating the same
摘要 Provided are a wire structure, a method of forming a wire, a thin film transistor (TFT) substrate, and a method of manufacturing the TFT substrate. The wire structure includes a barrier layer disposed on a lower structure, a copper conductive layer comprising copper or copper alloy disposed on the barrier layer, an intermediate layer comprising copper nitride disposed on the copper conductive layer, and a capping layer disposed on the intermediate layer.
申请公布号 KR101167661(B1) 申请公布日期 2012.07.23
申请号 KR20050064486 申请日期 2005.07.15
申请人 发明人
分类号 G02F1/136 主分类号 G02F1/136
代理机构 代理人
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