METHOD OF JUDGING DEFECT OF BLANK FOR EUV MASK AND METHOD OF MANUFACTURING EUV MASK

摘要

PURPOSE: A method for determining defect of a blank of a EUV mask and a method for manufacturing the EUV mask are provided to improve yield of the blank by determining whether the defect exists or not. CONSTITUTION: Defect information in regard to a blank is obtained(S1). Whether defect exists in the blank or not is identified based on the obtained defect information(S2). The defect is determined based on the defect information and design information when the defect exists(S3). Whether saving of the blank is possible or not is considered by displacing the forming location of a mask pattern about the blank when the defect exists(S5). The blank is determined as tasted goods when the saving of the blank is possible(S9). The blank is determined as defective goods when the saving of the blank is not possible(S10).