发明名称 TEMPERATURE SENSOR, MANUFACTURING METHOD FOR TEMPERATURE SENSOR, SEMICONDUCTOR DEVICE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND CONTROL METHOD FOR SEMICONDUCTOR DEVICE
摘要 PURPOSE: A temperature sensor, a temperature sensor manufacturing method, a semiconductor device, a semiconductor device manufacturing method, and a semiconductor device controlling method are provided to have the same structure with a semiconductor device constituting a memory or a logic circuit and enable to manufacture with the high compatibility. CONSTITUTION: A temperature sensor comprises a substrate(10) and charge trap type structures. The charge trap type structures are laminated on the substrate. The charge trap type structure comprises a silicon dioxide film(11), an oxide aluminum film(13), and an electrode(14). A Gas-cluster ion-beam investigation by gas in which an oxygen ion is injected or the gas including the oxygen is enforced on a surface of the oxide aluminum film A temperature corresponding to a flat band voltage can be measured by measuring the flat band voltage of the charge trap type structure.
申请公布号 KR20120081950(A) 申请公布日期 2012.07.20
申请号 KR20120003392 申请日期 2012.01.11
申请人 TOKYO ELECTRON LIMITED 发明人 TANAKA YOSHITSUGU
分类号 G01K7/01;H01L21/8247;H01L27/10;H01L29/82 主分类号 G01K7/01
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