发明名称 HIGH RESOLUTION SHADOW MASK HAVING PHOTORESIST FILM AND MANUFACTURING METHOD THEREOF
摘要 <p>PURPOSE: A photo-sensitive film containing shadow mask of high resolution and a method for manufacturing the same are provided to form the fine pattern of the shadow mask using a photo-sensitive film by using a metal plate as the support of the photo-sensitive film. CONSTITUTION: A shadow mask(100) includes a metal plate(10) and a first photo-sensitive film(20). A first opening(12) is formed at the metal plate. A photo-sensitive pattern(26) is formed at the first photo-sensitive film and divides the first opening. The photo-sensitive pattern includes a plurality of second openings(22) and at least one pattern forming part(24). The second openings partially expose the first opening. The pattern forming part is formed between the second openings. A virtual opening formed by connecting outermost second opening includes the first opening.</p>
申请公布号 KR20120081912(A) 申请公布日期 2012.07.20
申请号 KR20110034983 申请日期 2011.04.15
申请人 DONG-A UNIVERSITY RESEARCH FOUNDATION FOR INDUSTRY-ACADEMY COOPERATION 发明人 RYU, GI SEONG;PARK, JONG SEUNG;HWANG, JUNG WON;SONG, CHUNG KUN;YANG, JAE WOO
分类号 G03F1/38;H01L21/027 主分类号 G03F1/38
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