发明名称 |
IMPROVED SPRAY-TYPE PATTERN FORMING APPARATUS AND METHOD |
摘要 |
PURPOSE: A modified spraying type pattern forming apparatus and a method for the same are provided to form patterns of the same sizes and gaps on a substrate by using a linear type mask. CONSTITUTION: A modified spraying type pattern forming apparatus(200) includes one or more ink spraying units(210) and a linear mask(220). The ink spraying units spray ink on a substrate(230). The linear mask is arranged between the substrate and the ink spraying units. The ink spraying units are detachably mounted in the linear mask. A plurality of holes(222) is formed in the lower member(221) of the linear mask. A spraying type pattern forming method includes the following: the linear mask is arranged on the substrate; and the linear mask and the substrate are relatively moved to form a plurality of patterns(232) on the substrate by spraying ink on the substrate.
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申请公布号 |
KR20120081662(A) |
申请公布日期 |
2012.07.20 |
申请号 |
KR20100132357 |
申请日期 |
2010.12.22 |
申请人 |
NARAENANOTECH CORPORATION |
发明人 |
LEE, EUN KYUNG;KIM, YONG IL;CHOI, KYUNG HYUN |
分类号 |
B05B7/02;B05B15/04;G03F1/00 |
主分类号 |
B05B7/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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