| 摘要 |
<p>PURPOSE: A mask blank and a method for manufacturing the same are provided to reduce costs and efforts required for replacing an optical filter by filtering exposing light of specific wavelengths using a filtering film. CONSTITUTION: A mask blank includes a filtering film(12) on a substrate(11). The transmittance of the filtering film to exposing light of 313nm or less is lower than or equal to 40%. The filtering film includes one or more metals. The thickness of the filtering film is more than or equal to 30nm. The transmittance of the filtering film to i-line, h-line, and g-line is more than or equal to 60%. The filtering film further includes one or more of oxygen, nitrogen, carbon, hydrogen, and fluorine. The metals are one or more of Cr, Ti, Mo, Si, Ta, Hf, Ni, Zr, W, Co, V, Pd, Nb, Zn, Ge, Al, Pt, Mn, and Fe.</p> |
