THE APPARATUS AND METHOD FORMANUFACTURING OF BLANK MASK, AND BLANK MASK

摘要

PURPOSE: A blank mask manufacturing device, a blank mask manufacturing method, and a blank mask manufactured by the same are provided to manufacture a blank mask of high quality by enhancing the chemical resistance of a metal film of a mask blank, a uniformity of flatness, and an optical property. CONSTITUTION: A blank mask manufacturing method for forming more than at least one metal film on a substrate(10) comprises a target(21) and a heating unit. The target is arranged in a sputtering chamber(27) and comprises one or more metals. The substrate is arranged oppositely to the target. A member heating the substrate is a flash lamp or a hot plate(25).