PHOTOMASK INCLUDING SUPER LENS AND MANUFACTURING METHOD THEREOF

摘要

PURPOSE: A photo-mask and a manufacturing method thereof are provided to form a micro-pattern having high resolution by enhancing resolution of a stepper in the photo lithography process and to improve performance of a far-field super lens. CONSTITUTION: A substrate comprises an intaglio pattern(5). The mask pattern layer(20) is located within the intaglio pattern. A super lens is located on the substrate and the mask pattern layer. The super lens comprises a first negative refraction index layer(40) having a negative refraction index. A first dielectric layer(30) is located between the super lens and the substrate. A second dielectric layer(50) is located on the upper side of the super lens. A first sub pattern layer is located at one side either the upper side or the lower side of the first negative refraction index layer.