| 摘要 |
<p>PURPOSE: A method for eliminating a defect of a photo-mask is provided to easily eliminate a foreign material by inducing polarity variation of the surface of the foreign material generated on the surface of the photo-mask. CONSTITUTION: A photo-mask in which a foreign material(120) is adsorbed on a substrate is carried to a buffer substrate(400). A static electricity induction material layer(405) is coated on the buffer substrate. The photo-mask contacts to the buffer substrate. Repulsion force is induced between the buffer substrate and the foreign material. Fundamental force is induced between the static electricity induction material layer and the foreign material. The foreign material is adsorbed to the static electricity induction material layer. The foreign material adsorbed to the static electricity induction material layer is eliminated by eliminating the buffer substrate.</p> |
