发明名称 |
RESIST STRIPPING SOLUTION COMPOSITION, AND METHOD FOR STRIPPING RESIST BY USING SAME |
摘要 |
Disclosed is a resist stripping solution composition, which is highly capable of removing a resist pattern and an etching residue after dry etching or wet etching, manifests excellent anticorrosive effects on metal wiring including aluminum and/or copper because a predetermined polyol compound is used, and also can process a number of substrates because a predetermined amide compound is used, thus greatly contributing to reducing the cost. A method of stripping a resist using the resist stripping solution composition is also provided. |
申请公布号 |
US2012181248(A1) |
申请公布日期 |
2012.07.19 |
申请号 |
US201013387087 |
申请日期 |
2010.08.10 |
申请人 |
PARK MYUN-KYU;KIM TAE-HEE;KIM JEONG-HYUN;LEE SEUNG-YONG;KIM BYOUNG-MOOK;DONGWOO FINE-CHEM CO., LTD. |
发明人 |
PARK MYUN-KYU;KIM TAE-HEE;KIM JEONG-HYUN;LEE SEUNG-YONG;KIM BYOUNG-MOOK |
分类号 |
C23F1/02;G03F7/42 |
主分类号 |
C23F1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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