| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of achieving transfer of a pattern onto an almost defocus-free substrate without necessarily forming a focus position detection system or the like. <P>SOLUTION: An exposure apparatus comprises: first and second tables capable of moving independently of each other; a liquid immersion system that supplies a liquid to right below a projection optical system to form a liquid immersion region; and a driving system that moves both the first and the second tables below the projection optical system while holding the liquid immersion region right below the projection optical system so as to transit, from a first state where the liquid immersion region is held between the projection optical system and one of the first and the second tables, to a second state where the liquid immersion region is held between the projection optical system and the other of the first and the second tables. The first table has a mounting region of a substrate and its circumferential region, the substrate is mounted on the mounting region closely to the circumferential region so as to suppress an outflow of the liquid from a gap between the circumferential region and the substrate, and the substrate is moved by the first table relatively to the liquid immersion region. <P>COPYRIGHT: (C)2012,JPO&INPIT |
