发明名称 SEED MATERIAL FOR LIQUID PHASE EPITAXIAL GROWTH OF SINGLE CRYSTAL SILICON CARBIDE, AND METHOD FOR LIQUID PHASE EPITAXIAL GROWTH OF SINGLE CRYSTAL SILICON CARBIDE
摘要 <P>PROBLEM TO BE SOLVED: To provide an inexpensive seed material for liquid phase epitaxial growth of silicon carbide. <P>SOLUTION: The seed material 12 for liquid phase epitaxial growth of single crystal silicon carbide has a surface layer including polycrystalline silicon carbide whose crystal polymorph is 3C. Through Raman spectroscopic analysis where the excitation wavelength of the surface layer is set at 532 nm, peaks other than TO (transverse optical) peak and LO (longitudinal optical) peak are observed as peaks derived from polycrystalline silicon carbide whose crystal polymorph is 3C. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012136373(A) 申请公布日期 2012.07.19
申请号 JP20100288476 申请日期 2010.12.24
申请人 TOYO TANSO KK 发明人 TORIMI SATOSHI;NOGAMI AKIRA;MATSUMOTO TSUYOSHI
分类号 C30B29/36;C30B19/12;H01L21/208 主分类号 C30B29/36
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