THIN FILM DEPOSITION APPARATUS AND SUBSTRATE TREATMENT SYSTEM INCLUDING SAME

摘要

The present invention relates to a thin film deposition apparatus and a substrate treatment system including same. The thin film deposition apparatus includes a deposition chamber, a susceptor, a rotation mechanism, an elevation member, and an elevation driving unit. The deposition chamber has an inner space in which a deposition process is performed. The susceptor is disposed within the deposition chamber, and a plurality of substrates is seated on a top surface of the susceptor. The elevation member is disposed above the susceptor to support a portion of each side of the substrates seated on the susceptor. When the elevation member is operated, the substrates are separated from the susceptor or seated on the susceptor. The elevation driving unit elevates the elevation member.