| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition capable of producing a resist pattern having excellent resolution. <P>SOLUTION: A resist composition comprises a resin which has an acid-labile group, is insoluble or poorly soluble in an alkali aqueous solution and can be dissolved in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by formula (I), in which the resin has a structural unit derived from a monomer represented by formula (a2-0). [R<SP POS="POST">1</SP>to R<SP POS="POST">4</SP>represent an alkyl group, a saturated cyclic hydrocarbon group or an alkenyl group which may have a substituent and A<SP POS="POST">1</SP>represents a halogenated alkyl group.] <P>COPYRIGHT: (C)2012,JPO&INPIT |
