MUELLER MATRIX SPECTROSCOPY USING CHIROPTIC

摘要

An optical metrology device (100) produces a broadband beam of light (104) that is incident on and reflected by a sample (108) and introduces multiple variations in the polarization state of the beam of light induced by an optical chiral element (118). Using the detected light, the Muller matrix or partial Mueller matrix for the sample is determined, which is then used to determine a characteristic of the sample. For example, simulated spectra for a Mueller matrix for a model is fit to the measured spectra for the Mueller matrix of the sample by adjusting the parameters of the model until an acceptable fit between the simulated spectra and measured spectra from the Mueller matrices is produced. The varied parameters are then used as the sample parameters of interested, which can be reported, such as by storing in memory or displaying.