EUV PLASMA SOURCE TARGET DELIVERY SYSTEM

摘要

PROBLEM TO BE SOLVED: To address problems which may be associated with the utilization of piezoelectric materials in the environment of plasma generated EUV light source generators or specifically for target droplet generation in liquid jet target droplet generators.

SOLUTION: An EUV plasma formation target delivery system and method is disclosed which may comprise: a target droplet formation mechanism comprising a magneto-restrictive or electro-restrictive material; a liquid plasma source material passageway terminating in an output orifice; a charging mechanism applying charge to a droplet forming jet stream or to individual droplets exiting the passageway along a selected path; a droplet deflector intermediate between the output orifice and a plasma initiation site periodically deflecting droplets from the selected path; a liquid target material delivery mechanism comprising a liquid target material delivery passageway having an input opening and the output orifice; an electromotive disturbing force generating mechanism generating a disturbing force within the liquid target material; a liquid target delivery droplet formation mechanism having the output orifice; and/or a wetting barrier around the periphery of the output orifice.

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