| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a system to reduce effect of droplets on a last optical element or substantially to avoid such droplet formation. <P>SOLUTION: A lithographic apparatus comprises a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. A humid gas space is defined between the projection system, the liquid confinement structure and the immersion liquid in the immersion space, the humid gas space being configured to confine humid gas. <P>COPYRIGHT: (C)2012,JPO&INPIT |
