| 摘要 |
A drawing apparatus for drawing a pattern on a substrate by using a charged-particle beam comprises: a blanking deflector which deflects the charged-particle beam; a stopping aperture member which can block the charged-particle beam deflected by the blanking deflector; a catalyst which generates, from a gas, an active species for decomposing a deposit formed on the stopping aperture member; and a supply mechanism which supplies the gas to the catalyst. In a removing operation of removing the deposit, while the supply mechanism supplies the gas to the catalyst, the charged-particle beam irradiates a region which is not irradiated with the charged-particle beam in a drawing operation of drawing the pattern, thereby generating the active species from the gas by the catalyst positioned in at least the region, and removing the deposit by decomposing the deposit by the generated active species.
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