| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a transparent conductive thin film which is formed of a metal thin film having a thickness of 5-20 nm and containing silver and has low resistivity and high transmittance, and to provide a method for manufacturing the same. <P>SOLUTION: After a transparent substrate is subjected to ion bombardment treatment, a metal thin film having a thickness of 5-20 nm, preferably 5-10 μm, and containing silver is vapor-deposited on the transparent substrate to manufacture the transparent conductive thin film which has a resistivity of 10<SP POS="POST">-4</SP>Ω cm or lower and transmittances of light at wavelengths of 300 and 500 nm of 70% or higher, preferably 80% or higher. <P>COPYRIGHT: (C)2012,JPO&INPIT |
